Upper electrode and plasma processing apparatus

ABSTRACT

In an exemplary embodiment, an upper electrode is disposed in a processing chamber to face a susceptor and provided with a plate-like member and an electrode part. In an exemplary embodiment, the plate-like member is formed with a gas distribution hole that distributes a processing gas used for a plasma processing. The electrode part is formed in a film shape by thermally spraying silicon onto a surface of the plate-like member where an outlet of the gas distribution hole is formed.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. Pat Application No.16/296,827, filed on Mar. 8, 2019, which is a divisional of U.S. Pat.Application No. 14/415,258, filed Jan. 16, 2015, now abandoned, which isa 35 USC 371 National Phase Entry of Application No PCT/JP2013/068167,filed Jul. 2, 2013, which claims priority from Japanese Pat. ApplicationNo. 2012-158841, filed Jul. 17, 2012, and U.S. Provisional ApplicationNo. 61/674,509, filed Jul. 23, 2012, respectively, all of which areincorporated herein in their entirety by reference, and priority isclaimed to each of the foregoing.

TECHNICAL FIELD

Various aspects and embodiments of the present disclosure relate to anupper electrode and a plasma processing apparatus.

BACKGROUND

In semiconductor device manufacturing processes, plasma processingapparatuses have been widely used to perform plasma processings for thepurpose of, for example, depositing or etching a thin film. The plasmaprocessing apparatuses may involve, for example, a plasma chemical vapordeposition (CVD) apparatus that performs a deposition processing of athin film and a plasma etching apparatus that performs an etchingprocessing.

The plasma processing apparatus includes, for example, a processingcontainer that defines a plasma processing space, a placing table thatis provided in the processing container to place a substrate to beprocessed thereon, and an upper electrode that is disposed to face theplacing table across the plasma processing space and includes aconductive electrode plate.

In the plasma processing apparatus, since the upper electrode is exposeddirectly to plasma, the temperature of the upper electrode is increased.Therefore, it has been known that an electrode plate of the upperelectrode is provided on a relatively highly heat-conductive member inorder to suppress the increase of temperature. For example, PatentDocument 1 discloses that a plate-like member including a flow path of aprocessing gas for a plasma processing is formed of a conductivematerial having high heat conductivity, and an electrode plate of anupper electrode is detachably provided on a surface of the plate-likemember where the outlet of the flow path is formed, thereby performingthe cooling of the electrode plate.

PRIOR ART DOCUMENT Patent Document

Patent Document 1: Japanese Pat. Laid-Open Publication No. 2007-273596

DISCLOSURE OF THE INVENTION Problems to Be Solved

However, it was difficult to maintain the uniformity of the temperatureof the upper electrode in the prior art. That is, in the prior art,since the electrode plate is detachably provided on the surface of theplate-like member where the outlet of the processing gas flow path isformed, the electrode plate is bent by its own weight so that a gap isgenerated between the plate-like member and the electrode plate.Therefore, heat is hardly transmitted from the electrode plate to theplate-like member. As a result, the uniformity of the temperature of theupper electrode may be impaired in the prior art.

Means to Solve the Problems

An upper electrode according to an aspect of the present disclosureincludes a plate-like member and an electrode part. The plate-likemember is provided with a flow path that distributes a processing gasused for a plasma processing. The electrode part is formed in a filmshape by thermal spraying of silicon onto a surface of the plate-likemember where an outlet of the flow path is formed.

Effect of the Invention

According to various aspects and embodiments of the present disclosure,an upper electrode and a plasma processing apparatus are realized, inwhich the uniformity of the temperature of the upper electrode may bemaintained.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a vertical cross-sectional view schematically illustrating aconfiguration of a plasma processing apparatus according to an exemplaryembodiment.

FIG. 2 is a vertical cross-sectional view illustrating the upperelectrode according to the exemplary embodiment.

FIG. 3 is a vertical-sectional view illustrating modified example 1 ofthe upper electrode according to the exemplary embodiment.

FIG. 4 is a vertical-sectional view illustrating modified example 2 ofthe upper electrode according to the exemplary embodiment.

FIG. 5 is a vertical-sectional view illustrating modified example 3 ofthe upper electrode according to the exemplary embodiment.

FIG. 6 is a vertical-sectional view illustrating modified example 4 ofthe upper electrode according to the exemplary embodiment.

FIG. 7 is a vertical-sectional view illustrating modified example 5 ofthe upper electrode according to the exemplary embodiment.

FIG. 8 is a vertical-sectional view illustrating modified example 6 ofthe upper electrode according to the exemplary embodiment.

FIG. 9 is a vertical-sectional view illustrating modified example 7 ofthe upper electrode according to the exemplary embodiment.

DETAILED DESCRIPTION TO EXECUTE THE INVENTION

Hereinafter, various exemplary embodiments of the present disclosurewill be described with reference to drawings. Meanwhile, in eachdrawing, the same or corresponding parts will be denoted by the samereference numerals.

First, the entire configuration of a plasma processing apparatus will bedescribed. FIG. 1 is a vertical cross-sectional view schematicallyillustrating a configuration of a plasma processing apparatus accordingto an exemplary embodiment.

A plasma processing apparatus 2 is configured as a capacitively coupledparallel-plate plasma etching apparatus, and includes a processingchamber 21 serving as a processing container that defines a plasmaprocessing space for a plasma processing. On the bottom of theprocessing chamber 21 serving as a processing container, a support base23 is disposed via an insulating plate 22 that is made of a ceramic. Asusceptor 24 made of, for example, aluminum and constituting a lowerelectrode is provided on the support base 23. An electrostatic chuck 25is provided in a central upper portion of the susceptor 24 to attractand hold a wafer W serving as a substrate to be processed by anelectrostatic force. The electrostatic chuck 25 has a configuration inwhich an electrode 26 formed of a conductive film is sandwiched betweena pair of insulating layers. The electrode 26 is electrically connectedwith a direct current (DC) power supply 27.

In order to improve a uniformity of etching, a conductive focus ring(correction ring) 25 a made of, for example, silicon is disposed on thetop of the susceptor 24 so as to surround the electrostatic chuck 25.Reference numeral “28” in the drawing denotes a cylindrical inner wallmember made of, for example, quartz, and provided to surround thesusceptor 24 and the support base 23.

Inside the support base 23, a coolant chamber 29 is formed, for example,along the circumferential direction of the support base 23. A coolant ata predetermined temperature, for example, cooling water is circulatedand supplied from a chiller unit (not illustrated), which is providedoutside, into the coolant chamber 29 through pipes 30 a, 30 b. Theprocessing temperature of the wafer W on the susceptor 24 may becontrolled by the temperature of the coolant. Further, a heat transfergas, for example, helium (He) gas, supplied from a heat transfer gassupplying unit (not illustrated) to a gap between the upper surface ofthe electrostatic chuck 25 and the rear surface of the wafer W through agas supply line 31.

An upper electrode 4 is provided above the susceptor 24, which is thelower electrode, to face the susceptor 24 across the plasma processingspace of the processing chamber 21. A space between the upper electrode4 and the susceptor 24 forms the plasma processing space that generatesplasma.

Here, a configuration of the upper electrode 4 will be described indetail. FIG. 2 is a vertical cross-sectional view illustrating the upperelectrode according to an exemplary embodiment. As illustrated in FIG. 2, the upper electrode 4 includes a plate-like member 41 as an electrodebody, and an electrode part 42.

The plate-like member 41 is supported in an upper portion of theprocessing chamber 21 by an insulating shielding member 45. Theplate-like member 41 is formed in a disc shape by a conductive materialhaving relatively high heat conductivity such as, for example, aluminum,the surface of which is anodized, and functions as a cooling plate tocool the electrode part 42 which is heated by the plasma generated inthe plasma processing space. The plate-like member 41 includes therein agas introduction port 46 that introduces a processing gas for the plasmaprocessing, a gas diffusion chamber 43 that diffuses the processing gasintroduced from the gas introduction port 46, and gas distribution holes43 a serving as flow paths that distribute the processing gas diffusedby the gas diffusion chamber 43.

The electrode part 42 is formed in a film shape by thermally sprayingsilicon onto a surface 41 a of the plate-like member 41 where theoutlets of the gas distribution holes 43 a are formed. In the presentexemplary embodiment, the electrode part 42 is formed in a film shape,as well as in a disc shape corresponding to the shape of the plate-likemember 41, by thermally spraying silicon onto the surface 41 a of theplate-like member 41 where the outlets of the gas distribution holes 43a are formed. As for a method of thermally spraying silicon, a plasmaspraying method may be used, for example. The plasma spraying method isa film forming method, in which a film is formed by energizing a raregas in a nozzle to generate a plasma flow, feeding a thermal sprayingmaterial such as, for example, powdered silicon, into the generatedplasma flow, and injecting the plasma flow fed with the thermal sprayingmaterial to a workpiece from the nozzle. The plasma spraying method ischaracterized by a relatively high adhesion between the workpiece andthe film. Further, the film formed by the plasma spraying method ischaracterized by a high hardness, a strong adhesion between particles, ahigh density, and a smooth shape. Meanwhile, the plasma spraying methodis also characterized in that a thermal distortion of the workpiece issmall, and that deterioration of the workpiece may be suppressed.

The electrode part 42 includes gas introduction holes 42 a formed topenetrate the electrode part 42 in the thickness direction. The gasintroduction holes 42 a are arranged to be overlapped with the outletsof the gas distribution holes 43 a of the plate-like member 41.Therefore, the processing gas supplied to the gas diffusion chamber 43is diffused in a shower form and supplied into the processing chamber 21through the gas distribution holes 43 a and the gas introduction holes42 a.

Further, in the present exemplary embodiment, when the electrode part 42is formed by thermally spraying silicon, the resistivity of theperipheral portion of the electrode part 42 and the resistivity of acentral portion of the electrode part 42 are set to different values byadjusting concentrations of boron added to the silicon in the peripheralportion of the electrode part 42 and in the central portion of theelectrode part 42. The resistivity of the peripheral portion of theelectrode part 42 and the resistivity of the central portion of theelectrode part 42 may be set to different values within a range of 0.01mΩcm to 100 Ωcm. For example, the resistivity of the central portion ofthe electrode part 42 is set to a value larger than the resistivity ofthe peripheral portion of the electrode part 42 by adjusting theconcentration of the boron in the silicon in the central portion of theelectrode part 42 to a value larger than the concentration of the boronin the silicon in the peripheral portion of the electrode part 42.Accordingly, the impedance of the central portion of the electrode part42 with respect to the plasma becomes larger than that of the peripheralportion of the electrode part 42. Further, for example, the resistivityof the central portion of the electrode part 42 is set to a valuesmaller than the resistivity of the peripheral portion of the electrodepart 42 by adjusting the concentration of the boron in the silicon inthe central portion of the electrode part 42 to a value smaller than theconcentration of the boron in the silicon in the peripheral portion ofthe electrode part 42. Accordingly, the impedance of the central portionof the electrode part 42 with respect to the plasma becomes smaller thanthat of the peripheral portion of the electrode part 42.

Referring back to FIG. 1 , the gas introduction port 46 of theplate-like member 41 is connected with a gas supply pipe 47. The gassupply pipe 47 is connected with a processing gas source 48. The gassupply pipe 47 is provided with a mass flow controller (MFC) 49 and anopening/closing valve V1 sequentially from its upstream side. And, as aprocessing gas for etching, a gas such as, for example, a fluorocarbongas (C_(x)F_(y)) including C₄F₈ gas is supplied from the processing gassource 48 to the gas diffusion chamber 43 through the gas supply pipe47, and then, supplied into the processing chamber 21. The gas supplypipe 47, the processing gas supply source 48, and the upper electrode 4constitute a processing gas supply unit.

The upper electrode 4 is electrically connected to a variable DC powersupply 52 through a low pass filter (LPF) 51. The variable DC powersupply 52 is configured to turn ON/OFF power feeding by an ON/OFF switch53. The current/voltage of the variable DC power source 52 and theON/OFF of the ON/OFF switch 53 is adapted to be controlled by acontroller 54.

Further, when a high frequency power is applied to the susceptor 24 fromfirst and second high frequency power supplies 62, 64 to generate plasmain the plasma processing space, the ON/OFF switch 53 is turned ON by thecontroller 54 so that a predetermined negative DC voltage is applied tothe upper electrode 4. A cylindrical grounding conductor 21 a isprovided to extend above a height position of the upper electrode 4 fromthe side wall of the processing chamber 21. The grounding conductor 21 ahas an upper wall in its upper portion.

The susceptor 24, serving as the lower electrode, is electricallyconnected with the first high frequency power supply 62 through amatcher 61. Further, the susceptor 24 is electrically connected with thesecond high frequency power supply 64 through a matcher 63. The firsthigh frequency power supply 62 has a role to generate plasma in theplasma processing space between the upper electrode 4 and the susceptor24 by outputting a power having a high frequency of 27 MHz or more, forexample, 40 MHz. An etching processing is performed on the wafer W bythe plasma generated in the plasma processing space. The second highfrequency power supply 64 has a role to draw ion species generated byoutputting a power having a high frequency of 13.56 MHz or less, forexample, 2 MHz, to the wafer W held on the electrostatic chuck.

An exhaust port 71 is formed on the bottom of the processing chamber 21,and the exhaust port 71 is connected with an exhaust device 73, servingas an exhaust unit, through an exhaust pipe 72. The exhaust device 73includes, for example, a vacuum pump, and is able to decompress theinside of the processing chamber 21 to a desired vacuum pressure.Further, a wafer W carrying-in/out port 74 is formed on the side wall ofthe processing chamber 21, and the carrying-in/out port 74 may be openedor closed by a gate valve 75.

Reference numerals “76” and “77” in the drawing denote deposit shields.The deposit shield 76 is provided along the inner wall surface of theprocessing chamber 21. The deposit shield has a role to suppress anyetching byproducts (deposits) from adhering to the processing chamber21, and is detachably provided on the inner wall surface. A conductivemember (GND block) 79 is provided on a portion of the deposit shield 76constituting the inner wall of the processing chamber 21 atsubstantially the same height position as the wafer W and connected to aground in a DC mode. As a result, an abnormal discharge is suppressed.

According to the present exemplary embodiment, since the electrode part42 is formed in a film shape by thermally spraying silicon onto thesurface 41 a of the plate-like member 41 where the outlets of the gasdistribution holes 43 a are formed, it is possible to avoid a situationwhere a gap serving as a thermal resistance is generated between theplate-like member 41 and the electrode part 42. As a result, accordingto the present exemplary embodiment, since the uniformity of thetemperature of the upper electrode 4 including the plate-like member 41and the electrode part 42 may be maintained, a uniform plasma processingmay be performed on the entire processing target surface of the wafer W.

Meanwhile, since the upper electrode 4 is disposed to face the susceptor24 across the plasma processing space in the processing chamber 21, theelectrode part 42 of the upper electrode 4 is consumed due to damagecaused by plasma. According to the present exemplary embodiment, sincethe electrode part 42 is formed in a film shape by thermally sprayingsilicon onto the surface 41 a of the plate-like member 41 where theoutlets of the gas distribution holes 43 a are formed, the electrodepart 42 may be easily formed by thermally spraying silicon again even ina case where the electrode part 42 of the upper electrode 4 is consumed.As a result, according to the present exemplary embodiment, since it isunnecessary to replace the entire upper electrode 4, an increase in costassociated with the replacement may be suppressed.

Further, according to the present exemplary embodiment, since theresistivity of the peripheral portion of the electrode part 42 and theresistivity of the central portion of the electrode part 42 are set todifferent values, the impedance of the electrode part 42 with respect toplasma may be controlled properly. As a result, according to the presentexemplary embodiment, a uniform plasma processing may be performed onthe entire processing target surface of the wafer W.

In the above-mentioned exemplary embodiment, the upper electrode 4 hasbeen described as an example, in which the resistivity of the peripheralportion of the electrode part 42 and the resistivity of the centralportion of the electrode part 42 are set to different values byadjusting the concentrations of boron added to the silicon in theperipheral portion of the electrode part 42 and in the central portionof the electrode part 42. However, exemplary embodiments are not limitedthereto. Hereinafter, modified examples of the upper electrode 4 will bedescribed.

FIG. 3 is a vertical-sectional view illustrating modified example 1 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 104 according to modified example 1 is different from theupper electrode 4 illustrated in FIG. 2 in that an electrode part 142 isprovided in place of the electrode part 42. Accordingly, for the sameconfigurations as the upper electrode 4 illustrated in FIG. 2 , thedescriptions thereof will be omitted.

As illustrated in FIG. 3 , in the upper electrode 104 of modifiedexample 1, the resistivity of the peripheral portion of the electrodepart 142 and the resistivity of the central portion of the electrodepart 142 are set to different values by adjusting the film thicknessesof silicon in the peripheral portion of the electrode part 142 and inthe central portion of the electrode part 142. Preferably, theresistivity of the peripheral portion of the electrode part 142 and theresistivity of the central portion of the electrode part 142 are set todifferent values within a range of 0.01 mΩcm to 100 Qcm. In thisexample, the resistivity of the central portion of the electrode part142 is set to a value larger than the resistivity of the peripheralportion of the electrode part 142 by adjusting the film thickness of thesilicon in the central portion of the electrode part 142 to a valuelarger than the film thickness of the silicon in the peripheral portionof the electrode part 142. Accordingly, the impedance of the centralportion of the electrode part 142 with respect to the plasma becomeslarger than that of the peripheral portion of the electrode part 142.

According to the upper electrode 104 of modified example 1, since theresistivity of the central portion of the electrode part 142 is set to avalue larger than the resistivity of the peripheral portion of theelectrode part 142 by adjusting the film thickness of the silicon in thecentral portion of the electrode part 142 to a value larger than thefilm thickness of the silicon in the peripheral portion of the electrodepart 142, the impedance of the electrode part 142 with respect to theplasma may be controlled properly. As a result, according to the upperelectrode 104 of modified example 1, a uniform plasma processing may beperformed on the entire processing target surface of the wafer W.

FIG. 4 is a vertical-sectional view illustrating modified example 2 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 204 according to modified example 2 is different from theupper electrode 4 illustrated in FIG. 2 in that an electrode part 242 isprovided in place of the electrode part 42. Accordingly, for the sameconfigurations as the upper electrode 4 illustrated in FIG. 2 , thedescriptions thereof will be omitted.

As illustrated in FIG. 4 , in the upper electrode 204 of modifiedexample 2, the resistivity of the peripheral portion of the electrodepart 242 and the resistivity of the central portion of the electrodepart 242 are set to different values by adjusting the film thicknessesof silicon in the peripheral portion of the electrode part 242 and inthe central portion of the electrode part 242. The resistivity of theperipheral portion of the electrode part 242 and the resistivity of thecentral portion of the electrode part 242 are set to different valueswithin a range of 0.01 mΩcm to 100 Ωcm. In this example, the resistivityof the central portion of the electrode part 242 is set to a valuesmaller than the resistivity of the peripheral portion of the electrodepart 242 by adjusting the film thickness of the silicon in the centralportion of the electrode part 242 to a value smaller than the filmthickness of the silicon in the peripheral portion of the electrode part242. Accordingly, the impedance of the central portion of the electrodepart 242 with respect to the plasma becomes smaller than that of theperipheral portion of the electrode part 242.

According to the upper electrode 204 of modified example 2, since theresistivity of the central portion of the electrode part 242 is set to avalue smaller than the resistivity of the peripheral portion of theelectrode part 242 by adjusting the film thickness of the silicon in thecentral portion of the electrode part 242 to a value smaller than thefilm thickness of the silicon in the peripheral portion of the electrodepart 242, the impedance of the electrode part 242 with respect to theplasma may be controlled properly. As a result, according to the upperelectrode 204 of modified example 2, a uniform plasma processing may beperformed on the entire processing target surface of the wafer W.

FIG. 5 is a vertical-sectional view illustrating modified example 3 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 304 according to modified example 3 is different from theupper electrode 4 illustrated in FIG. 2 in that a ceramic film part 344is formed between the plate-like member 41 and the electrode part 42.Accordingly, for the same configurations as the upper electrode 4illustrated in FIG. 2 , the descriptions thereof will be omitted.

As illustrated in FIG. 5 , the upper electrode 304 of modified example 3includes a ceramic film part 344 formed in a film shape by thermallyspraying ceramic between the plate-like member 41 and the electrode part42. As the ceramic thermally sprayed between the plate-like member 41and the electrode part 42, alumina (Al₂O₃) or Yttria (Y₂O₃) may be used,for example. In this example, the ceramic film part 344 is formed overthe entire surfaces of the plate-like member 41 and the electrode part42.

Meanwhile, the ceramic film part 344 includes openings overlapped withthe gas distribution holes 43 a of the plate-like member 41 and the gasintroduction holes 42 a of the electrode part 42. Therefore, theprocessing gas supplied to the gas diffusion chamber 43 is diffused in ashower form and supplied into the processing chamber 21 through the gasdistribution holes 43 a, the openings of the ceramic film part 344, andthe gas introduction holes 42 a.

According to the upper electrode 304 of modified example 3, by theceramic film part 344, the plate-like member 41 may be protected fromthe plasma and the impedance of the electrode part 42 with respect tothe plasma may be controlled properly. As a result, according to theupper electrode 304 of modified example 3, a uniform plasma processingmay be performed on the entire processing target surface of the wafer W.

FIG. 6 is a vertical-sectional view illustrating modified example 4 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 404 according to modified example 4 has the same configurationas that of the upper electrode 304 illustrated in FIG. 5 , but isdifferent from the upper electrode 304 illustrated in FIG. 5 in that aceramic film part 444 is provided in place of the ceramic film part 344.Accordingly, for the same configurations as the upper electrode 304illustrated in FIG. 5 , the descriptions thereof will be omitted.

As illustrated in FIG. 6 , the upper electrode 404 of modified example 4includes a ceramic film part 444 formed in a film shape by thermallyspraying ceramic between the plate-like member 41 and the electrode part42. As the ceramic thermally sprayed between the plate-like member 41and the electrode part 42, alumina (Al₂O₃) or Yttria (Y₂O₃) may be used,for example. The ceramic film part 444 is formed at a positioncorresponding to the central portion of the electrode part 42. That is,in the electrode 404 of modified example 4, the ceramic film part 344 isformed only at a position corresponding to the central portion of theelectrode part 42, rather than being formed over the entire surface ofthe electrode part 42.

According to the upper electrode 404 of modified example 4, by theceramic film part 444 formed at a position corresponding to the centralportion of the electrode part 42, the plate-like member 41 may beprotected from the plasma and the impedance of the central portion ofthe electrode part 42 with respect to the plasma may be increased. As aresult, according to the upper electrode 404 of modified example 4, auniform plasma processing may be performed on the entire processingtarget surface of the wafer W.

FIG. 7 is a vertical-sectional view illustrating modified example 5 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 504 according to modified example 5 is different from theupper electrode 304 illustrated in FIG. 5 in that a ceramic film part544 is provided in place of the ceramic film part 344. Accordingly, forthe same configurations as the upper electrode 304 illustrated in FIG. 5, the descriptions thereof will be omitted.

As illustrated in FIG. 7 , the upper electrode 504 of modified example 5includes a ceramic film part 544 formed in a film shape by thermallyspraying ceramic between the plate-like member 41 and the electrode part42. As the ceramic thermally sprayed between the plate-like member 41and the electrode part 42, alumina (Al₂O₃) or Yttria (Y₂O₃) may be used,for example. The ceramic film part 544 is formed at a positioncorresponding to the peripheral portion of the electrode part 42. Thatis, in the electrode 504 of modified example 5, the ceramic film part544 is only at a position corresponding to the peripheral portion of theelectrode part 42 rather than being formed over the entire surface ofthe electrode part 42.

According to the upper electrode 504 of modified example 5, by theceramic film part 544 formed at a position corresponding to theperipheral portion of the electrode part 42, the plate-like member 41may be protected from the plasma and the impedance of the peripheralportion of the electrode part 42 with respect to the plasma may becontrolled properly. As a result, according to the upper electrode 504of modified example 5, a uniform plasma processing may be performed onthe entire processing target surface of the wafer W.

FIG. 8 is a vertical-sectional view illustrating modified example 6 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 604 according to modified example 6 is different from theupper electrode 304 illustrated in FIG. 5 in that a ceramic film part644 is provided in place of the ceramic film part 344. Accordingly, forthe same configurations as the upper electrode 304 illustrated in FIG. 5, the descriptions thereof will be omitted.

As illustrated in FIG. 8 , the upper electrode 604 of modified example 6includes a ceramic film part 644 formed in a film shape by thermallyspraying ceramic between the plate-like member 41 and the electrode part42. As the ceramic thermally sprayed between the plate-like member 41and the electrode part 42, alumina (Al₂O₃) or Yttria (Y₂O₃) may be used,for example. The film thickness of the ceramic film part 644 is set tobe different between the position corresponding to the peripheralportion of the electrode part 42 and the position corresponding to thecentral portion of the electrode part 42. In this example, the filmthickness of the ceramic film part 644 at the position corresponding tothe central portion of the electrode part 42 is set to a value largerthan the film thickness of the ceramic film part 644 at the positioncorresponding to the peripheral portion of the electrode part 42.Therefore, the impedance of the central portion of the electrode part 42with respect to the plasma may become larger than that of the peripheralportion of the electrode part 42.

According to the upper electrode 604 of modified example 6, since thefilm thickness of the ceramic film part 644 at the positioncorresponding to the central portion of the electrode part 42 is set toa value larger than the film thickness of the ceramic film part 644 atthe position corresponding to the peripheral portion of the electrodepart 42, the impedance of the electrode part 42 with respect to theplasma may be controlled properly. As a result, according to the upperelectrode 604 of modified example 6, a uniform plasma processing may beperformed on the entire processing target surface of the wafer W.

FIG. 9 is a vertical-sectional view illustrating modified example 7 ofthe upper electrode according to the exemplary embodiment. An upperelectrode 704 according to modified example 7 has the same configurationas that of the upper electrode 304 illustrated in FIG. 5 , but isdifferent from the upper electrode 304 illustrated in FIG. 5 in that aceramic film part 744 is provided in place of the ceramic film part 344.Accordingly, for the same configurations as the upper electrode 304illustrated in FIG. 5 , the descriptions thereof will be omitted.

As illustrated in FIG. 9 , the upper electrode 704 of modified example 7includes a ceramic film part 744 formed in a film shape by thermallyspraying ceramic between the plate-like member 41 and the electrode part42. As the ceramic thermally sprayed between the plate-like member 41and the electrode part 42, alumina (Al₂O₃) or Yttria (Y₂O₃) may be used,for example. The film thickness of the ceramic film part 744 is set tobe different between the position corresponding to the peripheralportion of the electrode part 42 and the position corresponding to thecentral portion of the electrode part 42. In this example, the filmthickness of the ceramic film part 744 at the position corresponding tothe central portion of the electrode part 42 is set to a value smallerthan the film thickness of the ceramic film part 744 at the positioncorresponding to the peripheral portion of the electrode part 42.Therefore, the impedance of the central portion of the electrode part 42with respect to the plasma may become smaller than that of theperipheral portion of the electrode part 42.

According to the upper electrode 704 of modified example 7, since thefilm thickness of the ceramic film part 744 at the positioncorresponding to the central portion of the electrode part 42 is set toa value smaller than the film thickness of the ceramic film part 744 atthe position corresponding to the peripheral portion of the electrodepart 42, the impedance of the electrode part 42 with respect to theplasma may be controlled properly. As a result, according to the upperelectrode 704 of modified example 7, a uniform plasma processing may beperformed on the entire processing target surface of the wafer W.

As described above, according to the plasma processing apparatus of thepresent exemplary embodiment, since the electrode part 42 is formed in afilm shape by thermally spraying silicon onto the surface 41 a of theplate-like member 41 where the outlets of the gas distribution holes 43a are formed, it is possible to avoid a situation where a gap serving asa thermal resistance is generated between the plate-like member 41 andthe electrode part 42. As a result, according to the present exemplaryembodiment, since the uniformity of the temperature of the upperelectrode 4 including the plate-like member 41 and the electrode part 42may be maintained, a uniform plasma processing may be performed on theentire processing target surface of the wafer W.

DESCRIPTION OF SYMBOL

-   1: plasma processing apparatus-   4, 104, 204, 304, 404, 504, 604, 704: upper electrode-   21: processing chamber (processing container)-   24: susceptor (lower electrode)-   25: electrostatic chuck-   41: plate-like member-   41 a: surface-   42, 142, 242: electrode part-   42 a: gas introduction hole-   43: gas diffusion chamber-   43 a: gas distribution hole (flow path)-   344, 444, 544, 644, 744: ceramic film part

What is claimed is:
 1. An upper electrode comprising: a plate-likemember provided with a flow path that distributes a processing gas usedfor a plasma processing; and an electrode part formed in a film shape bythermally spraying silicon onto a surface the plate-like member where anoutlet of the flow path is formed.
 2. The upper electrode of claim 1,wherein a resistivity of a peripheral portion of the electrode part anda resistivity of a central portion of the electrode part are set todifferent values by adjusting film thicknesses of the silicon in theperipheral portion of the electrode part and in the central portion ofthe electrode part.
 3. The upper electrode of claim 2, wherein theresistivity of the peripheral portion of the electrode part and theresistivity of the central portion of the electrode part are set todifferent values within a range of 0.01 mΩcm to 100 Ωcm.
 4. A plasmaprocessing apparatus comprising: a processing container configured todefine a plasma processing space; a lower electrode provided in theprocessing container and configured to place a substrate to be processedthereon; and an upper electrode disposed to face the lower electrodeacross the plasma processing space, wherein the upper electrodeincludes: a plate-like member provided with a flow path that distributesa processing gas used for a plasma processing; and an electrode partformed in a film shape by thermally spraying silicon onto a surface ofthe plate-like member where an outlet of the flow path is formed.